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HOME > J. Microbiol > Volume 50(6); 2012 > Article
Research Support, Non-U.S. Gov't
Enhancement of Butanol Tolerance and Butanol Yield in Clostridium acetobutylicum Mutant NT642 Obtained by Nitrogen Ion Beam Implantation
Xiao-Bo Liu , Qiu-Ya Gu , Xiao-Bin Yu , Wei Luo
Journal of Microbiology 2012;50(6):1024-1028.
DOI: https://doi.org/10.1007/s12275-012-2289-9
Published online: December 30, 2012
The Key Laboratory of Industrial Biotechnology, Ministry of Education, School of Biotechnology, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China
Corresponding author:  Xiao-Bin Yu , Tel: +86-0510-85918167, 
Received: 29 May 2012   • Accepted: 27 July 2012
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Abstract

As a promising alternative biofuel, biobutanol can be produced through acetone/butanol/ethanol (ABE) fermentation. Currently, ABE fermentation is still a small-scale industry due to its low production and high input cost. Moreover, butanol toxicity to the Clostridium fermentation host limits the accumulation of butanol in the fermentation broth. The wild-type Clostridium acetobutylicum D64 can only produce about 13 g butanol/L and tolerates less than 2% (v/v) butanol. To improve the tolerance of C. acetobutylicum D64 for enhancing the production of butanol, nitrogen ion beam implantation was employed and finally five mutants with enhanced butanol tolerance were obtained. Among these, the most butanol tolerant mutant C. acetobutylicum NT642 can tolerate above 3% (v/v) butanol while the wide-type strain can only withstand 2% (v/v). In batch fermentation, the production of butanol and ABE yield of C. acetobutylicum NT642 was 15.4 g/L and 22.3 g/L, respectively, which were both higher than those of its parental strain and the other mutants using corn or cassava as substrate. Enhancing butanol tolerance is a great precondition for obtaining a hyperyield producer. Nitrogen ion beam implantation could be a promising biotechnology to improve butanol tolerance and production of the host strain C. acetobutylicum.

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    Enhancement of Butanol Tolerance and Butanol Yield in Clostridium acetobutylicum Mutant NT642 Obtained by Nitrogen Ion Beam Implantation
    J. Microbiol. 2012;50(6):1024-1028.   Published online December 30, 2012
    DOI: https://doi.org/10.1007/s12275-012-2289-9
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